sputtering造句
61. Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.
62. The mailman would arrive on a motor-scooter, sputtering up the switchbacks of the driveway; the farm plow was horse-drawn.
63. In the visible range, the transmittances of samples are above 80%, with the increase of sputtering powers, the ultra-violet cutting-off edge show blue shift.
64. The results show that the extraction time and collision loss are decreased by increasing extraction voltage, but the sputtering loss increases and collection ratio decreases.
65. Mercury used as a cathode sputtering inhibitor in DC plasma displays with a content up to 30 mg per display until 1 July 2010.
66. TWO GUARDS open up with a fire hose. The con is slammed against the back of the cage, sputtering and hollering.
67. Morgenes went back to his painting, sputtering quietly to himself.
68. The sputtering yield dominated by elastic collision between HCIs and the material atoms with larger incident angle.
69. The method can be used not only for vacuum evaporation deposition, but also for sputtering deposition to prepare the thin-film.
70. The electronic circuitry of the various vacuum protection schemes, which use sputtering ion pump or cold-cathode or hot cathode ionization gauge as sensors, was compared.
71. A metallic cage made by sputtering silver film onto a thin nylon thread through a specially designed fixture is used as perturbing object to measure the higher modes in a Xband accelerating structure.
72. The Gd-Co films reported here were prepared by radio frequency sputtering and have been proved to have uniaxial anisotropy perpendicular to the film plane.
73. Equipped with varied kinds of Magnetron Sputtering coaters of vertical, in-line, reel-to-reel, and cylindric types, we are engaged in thin-film growing process.
74. A method prepares taste sensor containing hydrogel-carbon nanophase tube. Spoon-shaped metal-arc is prepared by vacuum sputtering and chemical deposition process on base plate.
75. The evaluating method of sputtering cleanout effect on metal target surface by volt-ampere characteristic of target cathode has been given, which provides effective approach to eliminate...
76. Due to the unique characteristic of the sputtering process in IBF, machining an aspheric surface is no more difficult than machining a planar surface.
77. Depth crystalline evolution property for microcrystalline Si films deposited by ion beam sputtering was studied.
78. A new rotating cylindric magnetron sputtering is presented and successfully pro- duced by ourselves.
79. A composite pump was developed which is composed of a non evaporable getter pump and a sputtering ion pump.
80. In the fourth chapter Sb - doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.
81. In this paper, WO3 thin film was deposited on glass substrate and silicon slice by DC reactive magnetron sputtering and using metal tungsten as target.
82. Crystalline anatase, rutile and mixture with anatase and rutile titanium oxide films were prepared by reactive unbalanced magnetron sputtering.
83. High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature.
84. The kinetic process of reactive magnetron sputtering has been studied.
85. Magnetically controlled cathod plasma sputtering technique was used to manufacture the plating manganin film.
86. It was also found that Ag is the preferential sputtering element for the AgNi alloys.
87. Analyses with XRD and XPS were made for the r. f magnetron sputtering deposited carbon film on tungsten substrate before and after Ar and N ions irradiation.
88. Third, using magnetron sputtering selective coating technology, in the coating layer by adding elements of titanium, than vacuum-tube collector performance improved remarkably.
89. A special coating system wsa newly developed for metallic film resistors deposited through magnetron sputtering process, which was available to provide low, medium and high-resistance films.
90. A wick was sputtering feebly in a dish of oil.
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