lithography造句
61. Blanket in Nano - imprint lithography procedure of periodic alternating stress of deformation.
62. Imprint lithography is a low - cost high - efficiency patterning technique - 100 nm resolution.
63. Course concepts include: concept design. layout. paste-up. and techniques such as engraving. etching. silkscreen. lithography. offset. drawing and cartooning. painting. collage. and computer graphics.
64. Paper in Nano - imprint lithography, mechanical deformation and distortion of process water absorption.
65. E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.
66. A process of soft lithography was introduced for fabrication of PDMS ( polydimethylsiloxane ) micro - mixer on micro - fluidic chip.
67. The company has Heidelberg Subaru four - color, color, offset lithography, double - sided printing presses, such as printing equipment.
68. Atom hologram lithography employs binary computer generated hologram to handle atoms for making microstructure.
69. Individual sodium titanate nanowire - based device is fabricated via e - beam lithography techniques.
70. Microfabrication of periodic structures by holographic lithography technology combining with visible laser-induce photopolymerization is developed in this paper.
71. The lithography and the manufacture technology are the lithograph most important art performance method.
72. ERS 10 Nano - imprint lithography system test of commercial enterprises.
73. Study on fabrication of silicon-based photon crystal slab with lithography and reactive ion etching is carried out.
73. Wish you will loveand make progress everyday!
74. Relief of the basic features available through the concavoconvex Nano - imprint lithography process can be fully expressed.
75. The advantage for the maskless lithography technology be reduce the mask costs.
76. This thesis introduces microsphere lithography ( MSL ) and photoelectrochemical (PEC) etching, and describes how to fabricate sub-micro triangular rods by these methods.
77. Die itsintercalation mounted on the reciprocating motion of the platforms, and nano - imprint lithography cylinder reciprocating contact.
78. The residual surface potential may introduce errors in following observations, affect measurement accuracy in critical dimension SEM and cause pattern placement errors in electron beam lithography.
79. Nanoimprint lithography drum, Nanoimprint lithography platform frequently, maintain its flat, smooth.
80. This article mainly explains the process of LIGA technology, which includes X - ray lithography, - electroforming and - copy.
81. The proximity effect in the E - beam lithography system was verified by experiments.
82. A microfabrication of periodic structures by holographic lithography technology combined with the visible laser-induced photopolymerization is developed in this paper.
83. The design and fabrication of high aspect-ratio hard X-ray zone plates by X-ray lithography are studied.
84. The room temperature imprint lithography has overcome many difficulties appeared HEL and has high resolution.
85. In this paper, Focused Ion Beam Lithography technology and is introduced.
86. The principle on stereo lithography, laser source , photo curing resin and photo - initiator were reviewed.
87. A novel process combining the self-assembly technique with electron beam lithography and selective chemical deposition was proposed for patterned film preparation.
123